CVD diamond deposition tool optimized for high pressure single crystaldiamond growth.

MPS 1200

• Fully Integrated System

• Embedded PC Control with integrated safety monitoring.

• Auto Profiles

• Suitable for unattended operation.

• 2.45 GHz – 3 and 6 KW

• Dual-differential pumped O-rings.

• Typical Growth area = 20 – 35 mm

• Process Pressure – 100-400 torr

• Stage 40 mm water cooled standard

• Adjustable substrate height, in-situ

• Optional stage designs are available, please inquire.

• Deposition Rates and area are process dependent, so please inquire.