Fully Integrated System

Embedded PC Control with integrated safety monitoring.

Auto Profiles

Suitable for unattended operation.

2.45 GHz – 3 and 6 KW

Dual-differential pumped O-rings.

Typical Growth area = 25-75 mm

Process Pressure – 20-250 torr

Stage 75 mm water cooled standard.

Adjustable substrate height, in-situ

Optional stages are available, including heated, temp. controlled and bias capable. Please inquire.

Deposition Rates and area are process dependent, so please inquire.