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All MW Plasma microwave CVD products incorporate proprietary plasma reactor technology and are specifically packaged for CVD Diamond processes.
Our inherent features offer maximum flexibility and control for research with internal tuning of the microwave fields.  This enables control of the plasma position over the substrate during growth and for a variety of substrate configurations and conditions.
All MW Plasma systems include in-situ adjustable stage height, high vacuum integrity and auto control of process cycle.  Current products available include

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MPS 700
2.45GHz 6 kW
Std Features

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MPS 1200
2.45GHz 6 kW
 HI Pressure

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MPS 1800
915MHz 20 kW
Std Features

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MPS 700C  MPS 700R
2.45GHz Compact and Higher Power

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MPS 1820
915 MHz
High Power / Latest Features

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