MW Plasma Technology founders’ have been dedicated to equipment and processes associated with CVD  Diamond for over 30 years.  From our predecessor companies to the creation of MW Plasma, our goal has been to enhance and improve the heritage designs and base line IP licensed from Michigan State University. This fundamental IP provides unique features of internal tuning that enables control of plasma position over a substrate and allows a broad range of process conditions within the same reactor. Throughout this history, we have developed a set of microwave CVD products that are robust to ensure the reliability for the process conditions required for CVD diamond growth.  Our philosophy is to incorporate feedback from our customers to direct enhancements now offered and underdevelopment at MW Plasma and we are continuing advanced product development based on that philosophy.